Scandium Aluminum Sputtering Target Description
Scandium Aluminum (Sc-Al) Sputtering Target is a specialized material used in thin film deposition for electronic and optical devices. Comprising a combination of scandium and aluminum, it enhances the properties of thin films, making them suitable for applications such as semiconductors and solar cells.
Scandium Aluminum Sputtering Target Specifications
Property | Description |
---|---|
Material | Scandium Aluminum Alloy |
Composition | Typically Scandium (Sc) and Aluminum (Al) |
Purity | High purity, often 99.9% or higher |
Shape | Cylindrical or planar |
Dimensions | Customizable based on customer specifications |
Grain Size | Fine, uniform grain structure |
Melting Point | Depends on specific alloy composition |
Density | Varies with alloy composition |
Sputtering Method | Physical Vapor Deposition (PVD) |
Substrate Compatibility | Silicon, glass, metals, and other materials |
Scandium Aluminum Sputtering Target Applications
- Microelectronics: Enhances conductivity in integrated circuits.
- Optical Coatings: Creates durable anti-reflective coatings.
- Solar Cells: Improves photovoltaic efficiency and corrosion resistance.
- Aerospace: Boosts corrosion resistance in coatings.
- Thin Film Resistors: Enables precise resistance in electronic circuits.
- Transparent Conductive Films: Enhances conductivity in displays.
- Catalysts: Used in catalyst layers for chemical processes.
Scandium Aluminum Sputtering Target Packing
Our scandium aluminum sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
Details
Chemical Formula | Sc/Al |
---|---|
Catalog Number | ST0109 |
CAS Number | 7440-20-2, 7429 |
Purity | 99.9%, 99.95%, 99.99% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
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