Aluminum Scandium Sputtering Target Description
Aluminum Scandium (AlSc) Sputtering Target is a specialized material used in the process of thin film deposition, particularly in the production of electronic and optical devices. This target is composed of a combination of aluminum (Al) and scandium (Sc) elements, and it is designed for use in sputtering systems.
Aluminum Scandium Sputtering Target Specification
Material Type | Aluminum Scandium |
Symbol | Al/Sc |
Color/Appearance | Gray solid, no order |
Density | 2.7 g/cm3 |
Technics | Hot Isostatic Pressing, Powder metallurgy |
Type of Bond | Not Recommended |
Applications | Semiconductor, CVD, PVD |
Aluminum Scandium Sputtering Target Packing
Our aluminum scandium sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
Details
Chemical Formula | Al/Sc |
---|---|
Catalog Number | ST0065 |
CAS Number | 7429-90-5, 7440 |
Purity | 99%, 99.5%, 99.9%, 99.95%, 99.99%, 99.999% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
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